一種製備單層紫膜晶片的方法A method of manufacturing a monolayer purple membrane chip

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

104131554

專利證號

I 541250

專利獲證名稱

一種製備單層紫膜晶片的方法A method of manufacturing a monolayer purple membrane chip

專利所屬機關 (申請機關)

國立臺灣科技大學

獲證日期

2016/07/11

技術說明

本創作為一種製備單層紫膜晶片的方法，透過氧化石墨烯與氧化卵白素之複合物以固定化紫膜於晶片基材上，並利用具有三維結構且可快速拆裝並重覆使用的微流道套件清洗該紫膜覆蓋的基材，可高效率、高再現性與高穩定性地製作穩固、單層、高覆蓋率且均一方向貼附的紫膜光電晶片，以得到最佳的紫膜光電效益，可應用於生物光電感測器或光電池製作。如此以氧化石墨烯與氧化卵白素複合物為架橋的生物親和性鍵結方式塗覆紫膜之製程，可降低紫膜堆疊情形，並使紫膜局部分散，同時再以剪應流清除並移動多餘的堆疊紫膜，使之再貼附、分散與重組，如此可使晶片的單層紫膜的面積覆蓋率可由21 %增加至92 %，晶片面積的總覆蓋率可由88 %增加至99 %，貼附紫膜的單層比例可由23 %增加至93 %。以本技術所提供的紫膜晶片製作技術可衍生製作各種光電裝置，如生物感測器、光電池與光感測器等，均具有高製程穩定性與再現性，適合商業化生產。 A monolayer purple membrane (PM) chip, which featured full coverage, reproducibility, robustness, and uniform PM orientation and exhibited the highest photocurrent, was prepared. A graphene oxide-oxidized avidin complex bridge was used to affinity-immobilize PM, followed by washing the chip with a reusable 3D-printed microfluidics. The washing not only significantly reduced PM stacking but also had PM undergo dynamic transitions and redistribution, resulting in the formation of a laterally continuous, full-sized, and unidirectional PM monolayer on the chip support. The substrate area covered by PM monolayer, the total substrate coverage, and the monolayer ratio were increased from 21% to 92%, from 88% to 99% and from 23% to 93%, respectively. The as-prepared PM chips can be readily applied to prepare a variety of optoelectronic devices, such as biosensors, photocells, and photo detectors with high process reproducibility and stability, which would benefit commercial mass production.

備註

連絡單位 (專責單位/部門名稱)

技術移轉中心

連絡電話

02-2733-3141#7346

網址