電化學噴嘴

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

109105159

專利證號

I 759689

專利獲證名稱

電化學噴嘴

專利所屬機關 (申請機關)

國立臺灣海洋大學

獲證日期

2022/04/01

技術說明

一種電化學噴嘴，適用於對一工件進行加工，該工件具有一第一電極。電化學噴嘴包含一殼體及至少一第二電極。殼體呈柱狀並包括一底面、一相反於該底面的頂面、一連接該底面及該頂面的外周面、一自該底面凹陷形成的凹室及一自該頂面凹陷形成並連通該凹室的通道。該通道具有一鄰近該頂面的輸入段及一自該輸入段朝該底面延伸並連通該凹室的漸縮段，該漸縮段的寬度由該輸入段朝該凹室漸減。第二電極設置於該凹室內且與該第一電極相間隔。 A nozzle device is provided for subjecting a workpiece to an electrochemical process. The workpiece has a first electrode. The nozzle device includes a nozzle body and at least one second electrode. The nozzle body has a recess provided in the bottom surface, and a longitudinal channel extending downwardly from the top surface along the longitudinal axis to be in fluid communication with the recess. The second electrode is disposed in the recess for being spaced apart from the first electrode. Because the recess is provided in the bottom surface of the nozzle body and because the second electrode is provided in the recess, an electrolytic solution may have a more even electric field distribution between the first and second electrodes, and a selected region on the workpiece may be evenly plated or etched.

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