發明
美國
09/458,305
6,303,809
有機金屬釕、鋨氣相沈積前驅物
國立清華大學
2001/10/16
A series of organometallic complexes of the general formula[M (CO)2L2]was provided, wherein M is ruthenium or osmium metal, and L is a β-diketonate ligand RC(O)CHC(O)R1where each of R and R1 is independently selected from the group consisting of atoms of the element,C,H,O and F. These ruthenium and osmium complexes possess enhanced volatility and thermal stability characteristcs, and are very suitable for CVD applications. Also disclosed are CVD methods by using these ruthenium or osmium complexes as source reagents for deposition of Ru,Os, RuO2,OsO2, and other Ru-or Os- containing films such as mixed metal oxide materials BaRuO3,SrRuO3, Sr2RuO4 and Bi2Ru2O7 or bimetallic alloys Pt/Ru and Pd/Ru.
智財技轉組
03-5715131-62219
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