原子力顯微鏡乾燥系統及原子力顯微鏡

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

103123192

專利證號

I 531796

專利獲證名稱

原子力顯微鏡乾燥系統及原子力顯微鏡

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2016/05/01

技術說明

依據本發明一可實施於原子力顯微鏡機台中的乾燥系統，包含一彈性體，其具有彈性且位於原子力顯微鏡掃描頭裝置及平台之間以形成一容置空間。樣本支撐基板位於容置空間內用以放置試片。進氣管從容置空間外部延伸至容置空間內部，藉以將一乾燥用氣體通入容置空間內。出氣管從容置空間內部延伸至容置空間外部，藉以將乾燥用氣體排出容置空間外。藉由使用乾燥氣體一進一出的作用機制把容置空間內部的水氣排出，把相對溼度(RH)降低至5%以下並維持空間內部恆壓以穩定。 A drying system for being disposed in an AFM device comprises an elastomer, a supporting substrate, an air-intake pipe and an exhaust pipe. The elastomer is disposed between a scanning head and a platform of the AFM device to form an accommodating space. The supporting substrate is disposed in the accommodating space and for supporting a specimen. The air-intake pipe extends from the outside to the inside of the accommodating space and feeds the accommodating space with drying air. The exhaust pipe extends from the inside to the outside of the accommodating space and exhausts the drying air from the accommodating space. By producing a drying air flow passing into and out of the accommodating space, the mist is exhausted out of the accommodating space. Therefore, the relative humidity in the accommodating space may be reduced to less than 5%, meanwhile the pressure in the accommodating space may be kept constant and stable.

備註

本部(收文號1100002967)同意該院110年1月12日清智財字第1109000186號函申請終止維護專利(國立清華大學)

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