Nano-imprint system with mold deformation detector and method of monitoring the same

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

10/791,926

專利證號

US 7,303,703

專利獲證名稱

Nano-imprint system with mold deformation detector and method of monitoring the same

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2007/12/04

技術說明

A system for nano-imprint with mold deformation detector is disclosed for real-time monitoring of the deformation of the mold. An electrostatic plate capacitor is embedded in the mold, serving as the deformation detector. The capacitor includes two opposite metal film electrodes formed by silicon micromachining technique on opposite surfaces of the mold and connected by a metal lead. During imprinting, the mold is acted upon by an external force and deformation occurs, which induces change of distance between the metal film electrodes and thus variation of the capacitance of the capacitor. The amount of deformation of the mold can then be assessed by comparing the capacitance with a reference. Thus, real-time detection and monitoring of the deformation of the nano-imprint mold is realized. Also disclosed is a method for carrying out the real-time monitoring of the deformation of the mold.

備註

本部(收文號1070053905)同意該校107年7月31日清智財字第1079004602號函申請申請終止維護專利

連絡單位 (專責單位/部門名稱)

智財技轉組

連絡電話

03-5715131-62219

網址