水氣阻障結構體的製造方法、水氣阻障結構體

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

107147480

專利證號

I 681870

專利獲證名稱

水氣阻障結構體的製造方法、水氣阻障結構體

專利所屬機關 (申請機關)

國立臺北科技大學

獲證日期

2020/01/11

技術說明

隨著可撓式有機發光二極體(organic light-emitting diode ,OLED)的市場規模擴張，其最首要的技術在於製程低水氣穿透率(water vapor transmission rate ,WVTR)的奈米級封裝薄膜。本研究以純鋅和純錫共濺鍍之鋅錫氧化物以及高分子氣相沉積堆疊於聚對苯二甲酸乙二酯(PET)上，設計一系列透明阻水氣複合膜。 鋅錫氧化物為主要的水氣阻隔層，本文以反應式磁控濺鍍技術沉積鋅錫氧化物，藉由參數的調整，包括濺鍍靶材的瓦數、反應氣體的流量、薄膜厚度等，製備出緻密鋅錫氧化物薄膜，進而分析各參數設定之影響關係。最適條件下單層鋅錫氧化物薄膜可使原基材(PET)從6.773g/m2・day下降至0.264 g/m2・day。 下一步進行高分子氣相之薄膜沉積，主要分為兩個步驟，第一步為高分子高溫裂解成兩個單體分子，接著單體分子於室溫中自行聚合反應沉積成膜。堆疊於上部分之製程，形成有機/無機複合薄膜，且可調控成膜的升溫速率，幫助達到較高的透光度。PET單層鍍上鋅錫氧化物透光度為78.87%，高分子氣相沉積薄膜後上升至85.23%，無機/有機一對的堆疊阻水氣值下降到0.046g/m2・day。 最終討論系列不同比例的鋅錫氧化物和高分子氣相沉積之搭配，進行元素分析、薄膜厚度、透光度、色度、表面微結構以及水氣穿透率的量測，並進行厚度減薄的實驗，可設計出一顏色近乎透明且高透光度之薄膜，僅以一層堆疊厚度為150nm左右達到阻水氣值為10-2g/m2・day效果。進由多層堆疊設計出最佳之複合薄膜，阻水氣效果達到5×10-5g/m2・day，平均穿透度為82.03%。 Due to the extend market in organic light-emitting diode (OLED), the skill of processing packaging with low water vapor transmission rate(WVTR) in nanometer size become more and more important. In this study, we design series transparent multilayers with low WVTR by sputtering pure zinc and tin along with chemical vapor deposition (CVD) on flexible PET films. The main barrier film is processing by ZTO. In this study, we use reactive magnetron sputtering to condensing ZTO thin film. In order to make dense ZTO thin film, adjusting factor including watts of sputtering, flow of reactive gas, thickness of film……etc. Furthermore analyze the results between different parameters. In the optimized condition, single layer ZTO thin film can make blank substrate (PET) decreasing from 6.773g/m2 to 0.264g/m2. Then start to do chemical vapor deposition CVD. It can be divided into two part. First, polymer will cleavage to two monomer. Second, monomer will get together to become film spontaneously. Stack onto the ZTO film which above-mentioned to get organic/inorganic multilayers. After CVD above the single ZTO layer, transmission rate increase from 78.87% to 85.23% and WVTR will declined to 0.046g/m2・day. At the last part, we discuss between different ratio of ZTO with CVD by element analyzing, transmission rate, color, surface structure and WVTR measurement. Try to make the film thinner and design the optimized multilayers. Successfully, make a transparent and colorless film in just 150nm thickness can achieve WVTR in 10-2g/m2 degree. Repeat the multilayers by stacking will get the best value achieve WVTR lower than 5×10-5g/m2・day and transmission rate in 82.03% in average.

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