反射掃描式同調光繞射顯影方法及系統

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

111133186

專利證號

I 799345

專利獲證名稱

反射掃描式同調光繞射顯影方法及系統

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2023/04/11

技術說明

一種反射掃描式同調光繞射顯影方法及系統中，二維光偵測器偵測照射在受測樣品的多個掃描位置的同調光束經繞射且被該受測樣品反射的繞射光束以獲得多個二維繞射資料分布；處理器將該等二維繞射資料分布轉換成在倒空間的多個二維強度分布，根據樣品函數、光源函數和該等二維強度分布進行多次的世代演算後獲得重建樣品函數其中每次世代演算依照該等二維強度分布的特定的組排序進行多次迭代演算，並根據該重建樣品函數且利用三維繪圖應用程式生成該受測樣品的表面形貌的三維重建影像，藉此實現具有相對較高的準確性和真實性的三維影像重建。In a reflective and scanning coherent diffraction imaging method and system, a two-dimensional photodetector detects the diffracted coherent light beams irradiated on a plurality of scanning positions of a sample under test and then reflected by the sample under test so as to obtain multiple two-dimensional diffraction data distributions. A processor transfers the two-dimensional diffraction data distributions into multiple two-dimensional intensity distributions in the reciprocal space using Fourier transformation, performs multiple generations of calculations based on a sample function, a light source function and the two-dimensional intensity distributions to obtained a reconstructed sample function, wherein, in each generation of calculations, multiple iteration calculations are performed according to a unique specific group order of the two-dimensional intensity distributions, and generates a three-dimensional reconstructed image of the surface topography of the sample under test based on the reconstructed sample function using a three-dimensional drawing application, thereby realizing there-dimensional image reconstruction with relatively higher accuracy and authenticity.

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