磁力輔助壓印的方法與系統

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

095100570

專利證號

I291414

專利獲證名稱

磁力輔助壓印的方法與系統

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2007/12/21

技術說明

This paper reports a novel imprint technique for fabrication of polymeric submicron-scale structures. In use of electromagnetic force to press the magnetic stamp written with submicron-scale structures into a UV-curable resist on the substrate, the liquid photopolymer can be patterned at room temperature. In this study, an electromagnetic force assisted imprinting facility with UV exposure capacity has been designed, constructed and tested. Under the proper processing conditions, the polymeric submicron-scale structure with feature size of 500nm across a 150mm2 area can be successfully fabricated. Scanning electron microscopy (SEM) and atomic force (AFM) observations confirm that the submicron-scale polymer structures are produced without defects or distortion and with good pattern fidelity over a large area.

備註

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