浮水印圖像及其製造方法WATERMARK AND MANUFACTURING METHOD THEREFOR

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

14/082,897

專利證號

US 9,124,819 B2

專利獲證名稱

浮水印圖像及其製造方法WATERMARK AND MANUFACTURING METHOD THEREFOR

專利所屬機關 (申請機關)

國立臺灣師範大學

獲證日期

2015/09/01

技術說明

一種隱藏式浮水印圖像及其製造方法，該浮水印圖像包含一第一區域及一第二區域，該第一區域由數個調幅網點組成，每一該調幅網點具有數個墨點部及數個空白部，每一該調幅網點之空白部位於同一該調幅網點的二相鄰墨點部之間，該第二區域由數個調頻網點組成。利用在每一該調幅網點填入數個空白部，可分散該等調幅網點的著墨濃度，藉此免除該等調幅網點及調頻網點的濃度校正。對輸出條件有可適應性，仍能達到浮水印圖像隱藏特性，且經複印後浮水印圖像可顯現。 A watermark and a manufacturing method therefor are provided. The watermark has a first region comprising amplitude modulation (AM) halftone dots and a second region comprising frequency modulation (FM) halftone dots, and each of the amplitude modulation halftone dots has ink portions and blank portions, each of which is located between the two ink portions in the same amplitude modulation halftone dot. The ink area percentage of the amplitude modulation halftone dots are dispersed by filling the blank portions into each of the amplitude modulation halftone dots, so that the density calibration of the amplitude modulation halftone dots and frequency modulation halftone dots can be omitted.

備註

連絡單位 (專責單位/部門名稱)

產學合作組

連絡電話

77341329

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