Liquid crystal photoelectric apparatus and manufacturing method of liquid crystal photoelectric apparatus

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

16/167,544

專利證號

US 10,754,201 B2

專利獲證名稱

Liquid crystal photoelectric apparatus and manufacturing method of liquid crystal photoelectric apparatus

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2020/08/25

技術說明

一種液晶光電裝置，包括上、下基板、多個配向層及液晶材料。這些配向層包括上、下配向層及至少一中間配向層。上、下配向層分別設於上、下基板上。至少一中間配向層設於上、下配向層之間。上配向層具有第一配向方向。下配向層具有第二配向方向。中間配向層具有中間配向方向。中間配向方向在第一配向方向與第二配向方向之間。液晶材料包括多個液晶材料部分。每一液晶材料部分設置於任二相鄰的配向層之間。另，一種製造液晶光電裝置的製造方法亦被提供。 A liquid crystal photoelectric apparatus including an upper and a lower substrates, a plurality of alignment layers and a liquid crystal material is provided. The alignment layers include an upper alignment layer, at least one intermediate alignment layer, and a lower alignment layer. The upper and lower alignment layers are respectively disposed on the upper substrate and the lower substrate. The least one intermediate alignment layer is disposed between the upper and the lower substrates. The upper alignment layer has a first orientation direction. The lower alignment layer has a second orientation direction. The intermediate alignment layer has an intermediate orientation direction. The intermediate alignment direction is between the first orientation direction and the second orientation direction. The liquid crystal material includes a plurality of liquid crystal material portions. Each of the liquid crystal material portions is disposed between any two adjacent alignment layers. Furthermore, a manufacturing method of the liquid crystal photoelectric apparatus is provided.

備註

本專利為本校與筑波科技股份有限公司執行科學工業園區研發精進產學合作計畫－基於空間調制器及壓縮感知之兆赫（太赫茲）單像素快速成像系統之衍生專利，專利權持有比詳如證明文件

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