類神經網路系統、高效率內嵌式人工突觸元件及其操作方法

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

111108656

專利證號

I 803234

專利獲證名稱

類神經網路系統、高效率內嵌式人工突觸元件及其操作方法

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2023/05/21

技術說明

【中文】 本發明提供一種高效率內嵌式人工突觸元件，其包含半導體基板、選擇電晶體、金屬層、第一記憶電晶體及第二記憶電晶體。選擇電晶體設置於半導體基板且包含選擇閘極結構、汲極區及源極區。金屬層連接汲極區。第一記憶電晶體包含第一閘極結構、第一電極區及第一憶阻器。第二記憶電晶體包含第二閘極結構、第二電極區及第二憶阻器。第二電極區與第一電極區彼此連接並形成連接區。連接區連接金屬層。第一憶阻器形成於第一閘極結構與連接區之間，第二憶阻器形成於第二閘極結構與連接區之間。藉此，輸出電壓具有良好的讀取視窗。 【英文】 The present disclosure provides a high efficiency embedded-artificial synaptic element, which includes a semiconductor substrate, a select transistor, a metal layer, a first memory transistor and a second memory transistor. The select transistor is disposed on the semiconductor substrate and includes a select gate structure, a drain region and a source region. The metal layer is connected to the drain region. The first memory transistor includes a first gate structure, a first electrode regions and a first memristor. The second memory transistor includes a second gate structure, a second electrode regions and a second memristor. The second electrode regions and the first electrode regions are connected to each other and form a connection region. The connection region is connected to the metal layer. The first memristor is formed between the first gate structure and the connection region, and the second memristor is formed between the second gate structure and the connection region. Therefore, the output voltage has a good read window.

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