繞射式雷射光學尺DIFFRACTION LASER ENCODER APPARATUS

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

10/775,857

專利證號

US 6,919,561 B2

專利獲證名稱

繞射式雷射光學尺DIFFRACTION LASER ENCODER APPARATUS

專利所屬機關 (申請機關)

國立臺灣大學

獲證日期

2005/07/19

技術說明

本發明的繞射式雷射光學尺之主要概念乃是利用光柵的繞射光中所含的相位資訊，來解析貼有光柵之附著物件的速度及位移，故本光學尺中光學元件之配置基本目的即為將光源投射至繞射光柵之上，並經由光學元件之相對配置來使得整體光學尺系統對於光柵光學尺所造成之相差及光柵光學尺與雷射光學頭之相對校準誤差有極高之容許度。由於入射光束係經由聚焦至繞射光柵上，訊號光之波前相對較不易受到繞射光柵本身幾何特性如間距不均或表面彎折之影響，不論是線性光柵，輻射狀光柵或圓柱狀光柵均可應用本發明之設計，進而得到極佳的訊號能見度(visibility)。由於本發明所使用之光學元件經大幅化約及繞射光柵本身較一般幾何光柵細小，故極適合用微小系統之定位之用。 A diffraction laser encoder apparatus for positional and movement information measurement of a target made with a diffraction grating. The diffraction laser encoder has a laser light source, a polarization beam splitter for receiving the source beam for splitting a P-polarization component and an S-polarization component of the source beam into parallel and offset beams and focusing lens to focuse the P-polarization component and the S-polarization component beams onto the target diffraction grating and returning diffracted P-polarization and diffracted S-polarization beams back into the polarization beam splitter for generating a detector beam coaxially containing the diffracted P-polarization and the diffracted S-polarization beams. A detector assembly receives the detector beam for electrical processing and analysis for resolving the positional and movement information. In the process, phase information contained in the diffraction signal returned by the target is analyzed.

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