量化材料殘餘應力之裝置及其方法

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

100101090

專利證號

I 454674

專利獲證名稱

量化材料殘餘應力之裝置及其方法

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2014/10/01

技術說明

本專利技術為一種量化材料殘餘應力之裝置及方法，係用以量化一具有光學雙折射性質或暫態光學雙折射性質之待測物之殘餘應力，該裝置包括：一光源；一偏光鏡；一標準試片；一檢光鏡；一施載單元；一光譜儀及一檢測模組；該方法包括步驟：施載該標準試片；記錄從該檢光鏡穿透之光的光強，以得到該標準試片之穿透率；重覆該施載步驟以及該記錄步驟以得到該標準試片之應力與穿透率變化關係，而得到該標準試片之應力量化公式；及利用該標準試片之應力量化公式以及該待測物之穿透率，得到該待測物之應力分佈。 An apparatus for quantifying residual stress of a material and a method thereof are disclosed. The apparatus comprises: a light source; a polarizer; a standard specimen; an analyzer; a loading unit is used for stretching the standard specimen; a spectrometer is used for recording an intensity of the visible light through the analyzer; and a detecting module is used for getting the stress distribution of the material; the method comprises: stretching the standard specimen; recording the intensity of light through the analyzer and getting the transmissivity of the standard specimen; deriving a stress quantifying formula by repeating the stretching and the recording steps to get the relation of transmissivity and stress of the standard specimen; and getting the stress distribution of the specimen by the stress quantifying formula and the transmissivity of the specimen. Hence, the apparatus and the method can quantify residual stress of the material.

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