類鑽碳膜去除方法及製成品

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

093136051

專利證號

I248123

專利獲證名稱

類鑽碳膜去除方法及製成品

專利所屬機關 (申請機關)

明道學校財團法人明道大學

獲證日期

2006/01/21

技術說明

本發明類鑽碳薄膜去除方法及製成品，係將一經表面被覆類鑽碳薄膜處理後之構件，浸泡於 氯化氫水溶液中，可去除 構件表面之類鑽碳薄膜。此外，可有效改善過去常發生附著性不佳而導致構件表面之點或面 的局部剝落之在被覆情 況。 The invention relates to a method for removing diamond-like carbon films and its products. The method is to immerse the units that are coated with diamond-like carbon films into the hydrogen chloride solution to come off the coating, which was located on the units surface. Besides, the method can effectively improve the past faults due to worse adhesion, which made the dots or faces of the local coating of the units usually peeled off.

備註

連絡單位 (專責單位/部門名稱)

產學合作處

連絡電話

04-8876660 轉2400

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