立體光阻微結構的製作方法

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

098114840

專利證號

I 399620

專利獲證名稱

立體光阻微結構的製作方法

專利所屬機關 (申請機關)

財團法人國家同步輻射研究中心

獲證日期

2013/06/21

技術說明

掃描式微影方法雖已被提出可應用於製作3D微結構，但光罩與光阻間距必須僅可能縮小以減小繞射誤差，提升微影精度。然而為了讓光罩與光阻在極小的間距作相對運動，光阻厚度均勻度與移動平台的精度必須嚴格要求，不利於大尺寸微結構的實際製作。 本發明內容主要是在掃描微影方法中，在光罩與光阻之間施加一光折射之媒合液體(matching fluid)以減小繞設誤差，因此光罩/光阻間距便可適當放寬。此外，此媒合液體亦可作為光罩/光阻相對運動之潤滑劑，極有利於掃描微影之進行。結合上述優點，本發明專利所提出之掃描浸潤式微影技術(SIL, Scanning Immersion Lithography)非常適合應用於製作高精度，大面積的3D光學微結構。 A scanning (or moving mask) lithography scheme has been used to fabricate 3D microstructure. The gap between the mask/resist has to be minimized for reducing diffraction error. To avoid sticking, the uniformity of the resist thickness and precision of the stage are highly demanded. This will become very critical when performing large-area scanning. In this patent, we propose the first time combining the merit of scanning and immersion lithography to fabricate 3D microstructure. With the matching fluid to reduce the diffraction error, the gap between the mask/resist becomes more tolerable. In addition, the liquid also act as a lubricant for achieving smooth scanning. These advantages might make the proposed scanning immersion lithography (SIL) a promising technique to fabricate high-precision, large-area 3D optical microstructure.

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