SUN PROTECTION MATERIAL AND SUN PROTECTION COMPOSITION CONTAINING THE SAME

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

15/581,682

專利證號

US 10,039,705

專利獲證名稱

SUN PROTECTION MATERIAL AND SUN PROTECTION COMPOSITION CONTAINING THE SAME

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2018/08/07

技術說明

SUMMARY OF THE INVENTION The invention provides a sun protection material and a sun protection composition containing the sun protection material capable of scattering light in a wavelength range between 250 nm and 400 nm, such that the UV protection capability of the sun protection composition is enhanced. The invention provides a sun protection material including a plurality of polystyrene microspheres and a plurality of refractive layers. The polystyrene microspheres have a particle size of 150 nm to 300 nm. Surfaces of the polystyrene microspheres are at least partially covered by the refractive layers. The sun protection material can scatter a light in a wavelength range between 250 nm and 400 nm. In an embodiment of the invention, the refractive layers include titanium dioxide, zinc oxide, silicon oxide or a combination thereof. In an embodiment of the invention, the refractive layers are amorphous. In an embodiment of the invention, a refractive index of the refractive layers is greater than a refractive index of the polystyrene microspheres. In an embodiment of the invention, the surfaces of the polystyrene microspheres are completely covered by the refractive layers. In an embodiment of the invention, the polystyrene microspheres are solid microspheres. In an embodiment of the invention, a ratio of a long diameter and a short diameter of each of the polystyrene microspheres is between 1.03 and 1.07. In an embodiment of the invention, a difference of any two diameters of the polystyrene microspheres is less than 20 nm. In an embodiment of the invention, the difference of any two diameters of the polystyrene microspheres is between 6.8 nm and 15.2 nm. In an embodiment of the invention, the standard deviation of the particle size distribution of polystyrene microspheres is less than 2.35 nm. The invention provides a sun protection composition including the above mentioned sun protection material and a UV absorbent. Based on 100 wt% of the sun protection composition, a content of the sun protection material is 0 wt% to 10 wt%. In an embodiment of the invention, the sun protection composition has an SPF value of at least 50. Based on the above, the sun protection material of the invention has polystyrene microspheres having a particle size of 150 nm to 300 nm, such that the sun protection material can scatter light in a wavelength range between 250 nm and 400 nm. In addition, the refractive layers having the refractive index more than the refractive index of the polystyrene microspheres at least partially cover the surfaces of the polystyrene microspheres, so as to enhance the ability of refracting light in a wavelength range between 250 nm and 400 nm. Therefore, the sun protection composition containing the sun protection material can scatter light in a wavelength range between 250 nm and 400 nm, such that the UV protection capability of the sun protection composition is enhanced. In order to make the aforementioned features and advantages of the disclosure more comprehensible, embodiments accompanied with figures are described in detail below.

備註

本會(收文號1120009636)同意該校112年2月16日清智財字第1129001196號函申請終止維護專利(國立清華大學)

連絡單位 (專責單位/部門名稱)

智財技轉組

連絡電話

03-5715131-62219

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