發明
中華民國
098145718
I 452946
電漿反應裝置
國立雲林科技大學
2014/09/11
本專利之微波電漿火炬反應裝置係改良反應腔體的真空隔離單元,其係利用一石英圓柱體封設在反應腔體與導波管間,以分隔負壓之反應區與正壓之微波傳導區,而達到絕緣、使微波通過、耐熱及真空之多重效果。如此反應腔體可穩定維持在低壓狀態,並使內部最初之少數氣體分子獲得足夠之微波能量來點燃電漿火炬,進而使後續之進料氣體產生穩定且持續之分解反應,同時維持一定之電漿密度;且因真空隔離單元為石英圓柱體及耐熱墊圈所組成,可增加耐久性、達到穩定且長時間之操作,並能降低操作成本。 The microwave plasma torch reaction device disclosed in this patent improved the vacuum isolating unit (VIU) of the reaction chamber. The VIU, mainly a quartz cylinder seal located at the intersection area between the reaction chamber and the microwave guiding tube, is employed to separate the negative pressure of the reaction zone and the pressure from the microwave conducting area. The design can achieve the multifunction of insulation, allow microwave pass through, endure heat, and maintain vacuum. Therefore the reaction chamber can steadily maintain a low pressure condition, provide enough microwave energy for the initial small amount of gas molecules to ignite a microwave plasma torch, maintain a stable and continuous decomposing reaction for the following inlet gas, and maintain specific plasma density. The VIU is composed of quartz cylinder and heat resisted o-rings, it can therefore increase durability, achieve stable and long hours of operation, and reduce operating costs.
本會(收文號1120003127)同意該校112年1月11日雲科大研字第1120500024號函申請終止維護專利(國立雲林科技大學)
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