Graphene-based antibacterial therapy and using the same

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

14/019,273

專利證號

US 9,345,797 B2

專利獲證名稱

Graphene-based antibacterial therapy and using the same

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2016/05/24

技術說明

本發明提供一種抗菌材料，可吸收一光源進行放熱並具有捕捉細菌的效果，該抗菌材料係由RMG表示，其中G代表石墨烯氧化物，M代表表一磁性材料，R為一醛類化合物、一二醛類化合物或一多醛類化合物。另外，上述抗菌材料的製備方法至少包含下列步驟：首先，製備一石墨烯氧化物，再將磁性材料修飾於還原之石墨烯氧化物上。最後，將醛類化合物修飾於磁性材料與還原之石墨烯氧化物表面。當要使用上述抗菌材料時，可將一含細菌溶液與上述抗菌材料接觸，以光源照射此含細菌溶液與上述抗菌材料，並以磁鐵使抗菌材料與細菌聚集於光源集中處，使用完畢可利用磁鐵回收以進一步重複使用或丟棄。 Photothermal antibacterial material RMG is provided in the present invention, where R represents aldehyde, di-aldenhyde or multi-aldehyde, M is magntic material, and G is reduced graphene oxide. A method of synthesizing the abovementioned antibacterial material comprises of three steps. First graphene oxide was synthesized, followed by simultaneous reduction and functionlization with magnetic nanoparticles (MG), and finally an aldehyde is modified on the surface of the magnetic material to yield magnetic reduced graphene oxide functionalized glutaraldehyde (RMG). We utilize the photothermal feature of graphene for antibacterial activity, in addition functionalizing graphene with aldehyde to possess a bacteria capturing capability and with magnetic material to enhance a focusing of light irradiation. The use of microfluidic chip system provides a great environment for this photothermal therapy.

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連絡單位 (專責單位/部門名稱)

智財技轉組

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03-5715131-62219

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