二氧化鈦鍍膜方法

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

102101504

專利證號

I 457473

專利獲證名稱

二氧化鈦鍍膜方法

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2014/10/21

技術說明

本技術為電沉積二氧化鈦薄膜，並可藉由改變電鍍參數而能有效控制厚度、孔洞性及表面形貌，除此之外，所需設備成本低廉。電沉積二氧化鈦步驟如下：將氧化劑（硝酸鹽或亞硝酸鹽）添加到含Ti3+的電解液，可將Ti3+氧化成Ti4+，再將其溶液放入電鍍裝置中。將基材沒入電鍍液中，利用陰極沉積將硝酸鹽或亞硝酸鹽還原形成氫氧根離子，溶液中Ti4+會與氫氧根離子反應，進一步沉積二氧化鈦至基材上，再經過熱處理使二氧化鈦有銳鈦礦的晶相。 The present invention is directed to provide an electrolytic method for coating titanium dioxide to gain the advantages of controlling the thickness, porosity, and morphology by varing the electroplating parameters. The present invention is directed to a cathodic deposition method for coating a titanium dioxide film with higher yield in comparison with the prior arts. According to one embodiment, the present invention provides a titanium dioxide coating method, which includes following steps. An electrolyte containing Ti3+, an oxidant and at least one of NO3- and NO2- is provided for an electrodeposition device, wherein the oxidant is configured for essentially oxidizing Ti3+ into Ti4+. A substrate is immersed into the electrolyte and electrically connected to the electrodeposition device. A cathodic current from the electrodeposition device is applied to the substrate for reducing NO2- or NO3- to generate extensive OH- and to form titanium dioxide film on the surface of the substrate

備註

本部(第1080029889號)同意該校108年05月14日清智財字第1089003165號函報專利終止維護案。

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