METHOD OF PATTERNING A THIN FILM

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

14/732,774

專利證號

US 9,625,820 B2

專利獲證名稱

METHOD OF PATTERNING A THIN FILM

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2017/04/18

技術說明

本發明是一種薄膜圖案形成方法，包含形成薄膜、覆蓋光罩於薄膜以及進行溶劑退火與照光步驟。其中薄膜包含第一分子，第一分子具有共軛結構。光罩包含至少一曝光區，溶劑退火與照光步驟中使用光源照射薄膜，並在第一溶劑氛圍下進行，光源的波長範圍對應第一分子達到激發態的能量。藉此，薄膜對應曝光區的照光區厚度增加或減少，以於薄膜形成圖案。本發明的薄膜圖案形成方法具有簡化製程、提高生產效率與符合環保訴求等優點。此技術可用於材料表面之精密成形,以及在固態薄膜中有機共軛分子之濃度分佈. Method of patterning thin film includes steps as follows. A thin film is formed, a mask covers the thin film, and a solvent annealing and illuminating step is conducted. The thin film includes a first molecule which includes a conjugated structure. The mask includes at least one exposure area. A light source is used to illuminate the thin film in the solvent annealing and illuminating step, and the solvent annealing and illuminating step is conducted under atmosphere of a first solvent. The range of the wavelength of the light source is correspondent to the energy allowing the first molecule to reach an excited state. Thus, a thickness of an illuminated area of the thin film is increased or decreased, and a pattern is accordingly formed on the thin film. This method can be used for fine patterning and spatial distribution control of organic conjugated molecules in solid films with the advantages of simplicity, efficiency enhancement, and environmenal friendliness.

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