雙光子發射性斷層掃描系統及方法

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

100109690

專利證號

I 430777

專利獲證名稱

雙光子發射性斷層掃描系統及方法

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2014/03/21

技術說明

本發明揭露一種雙光子發射性斷層掃描 (DuPECT) 系統。本系統應用某些同位素在衰變過程中可放射出至少兩個光子，以作射源定位。此系統包含複數個模組偵測器藉由一同符電路連接，此模組偵測器包含一準直儀，以用來定義入射光子的訊號軌跡。當模組偵測器同時偵測到同位素發射的至少兩個光子的訊號時，射源位置則位於兩個光子軌跡的交點。此模組偵測器可依照待測物的形狀排列組合設置在此待測物的周圍，特別適用於局部器官、或小動物的照影。 A dual photon emission computed tomography (DuPECT) system is provided. The present invention uses certain isotopes that emit at least two photons during the decay for the purpose of emission source positioning. The system includes a plurality of modular detectors connected to a coincident circuit, and each modular detector is equipped with a collimator to determine the direction of the incident photon trajectory. When the modular detectors simultaneously detect the signals of two photons issued by the isotopes, the source position is located at the intersection of the trajectories of to photons. The modular detectors can be arranged around the objected to be detected according to the shape of the object and is particularly suitable for imaging of regional organs and small animals.

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