干涉成像裝置及其系統

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

100131256

專利證號

I 467154

專利獲證名稱

干涉成像裝置及其系統

專利所屬機關 (申請機關)

國立臺灣大學

獲證日期

2015/01/01

技術說明

本發明係有關於一種極紫外線干涉成像裝置與方法，其主要使用極紫外線作為干涉成像系統之系統射源，進行待測物各部的影像建立，並大幅提升影像之縱向解析度，因此可對待測樣本進行精密的三維斷層檢測。其中所使用之極紫外線源波長小於30nm，且射源頻寬主要大於0.1nm以達成奈米等級之縱向解析度。本發明統合極紫外線射源之極短波長優點與OCT技術之縱向解析度特性，發展出極高縱向及橫向解析度之造影系統，對於未來半導體工業上之檢測，或生醫遺傳工程之研究分析，皆為不可或缺之重要技術。 The invention is about am image system based on extreme ultraviolet interferometer, it mainly uses extreme ultraviolet imaging system as an interferometer system radiation source, the image creation ministries analytes and increases the vertical resolution of the image, it can treat test samples for precise three-dimensional fault detection. One source used by the extreme ultraviolet wavelength of less than 30nm, and the radiation source primarily larger than 0.1nm bandwidth to achieve nanometer level of the vertical resolution. Integration of the present invention is extremely extremely short wavelength ultraviolet radiation source OCT technology advantages and characteristics of vertical resolution, the development of a high vertical and horizontal resolution of the imaging system, the semiconductor industry for the future of testing, or genetic engineering of biomedical research and analysis , are all essential importance of technology.

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