於不改變形貌下將低還原電位金屬轉換成高還原電位金屬之方法Method for transferring a metal with a relative low reduction potential into a metal with a relative high reduction potential without changing its shape

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

101139747

專利證號

I 476282

專利獲證名稱

於不改變形貌下將低還原電位金屬轉換成高還原電位金屬之方法Method for transferring a metal with a relative low reduction potential into a metal with a relative high reduction potential without changing its shape

專利所屬機關 (申請機關)

國立成功大學

獲證日期

2015/03/11

技術說明

本發明係有關於一種於不改變形貌下將低還原電位金屬轉換成高還原電位金屬之方法，包括下列步驟：提供一第一金屬基材、及一反應溶液，其中反應溶液係包括一第二金屬前驅物、一陽離子介面活性劑及一弱還原劑；以及將第一金屬基材置於反應溶液中並反應一預定時間，以使第一金屬基材轉換成一第二金屬基材；其中，第一金屬基材之第一金屬之還原電位係小於第二金屬基材之第二金屬之還原電位，且第一金屬基材與第二金屬基材之外型係相同。 A method for transferring a metal with a relative low reduction potential into a metal with a relative high reduction potential without changing its shape is disclosed, which comprises the following steps: providing a first metal substrate and a reaction solution, wherein the reaction solution comprises a second metal precursor, a cation surfactant, and a weak reducing agent; and placing the first metal substrate into the reaction solution for a predetermined time to transfer the first metal substrate into a second metal substrate. Herein, the reduction potential of a first metal of the first metal substrate is lower than that of a second metal of the second metal substrate, and the shapes of the first metal substrate and the second metal substrate are the same.

備註

本部(收文號1060027134)同意該校106年4月25日成大研總字第1064500318號函申請終止維護專利

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