METHOD OF FABRICATING COMPOSITE PDMS MICROSTRUCTURE

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

14/829,621

專利證號

US 9,644,257 B2

專利獲證名稱

METHOD OF FABRICATING COMPOSITE PDMS MICROSTRUCTURE

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2017/05/09

技術說明

本發明提供一種聚二甲基矽氧烷複合結構之製造方法，包含一定義步驟、一真空沉積步驟及一蝕刻步驟。其中定義步驟係在一聚二甲基矽氧烷基材上定義具有一硫醇官能基單分子之一圖案區域，硫醇官能基單分子呈液相。真空沉積步驟係利用一真空鍍膜法在一活化時間內沉積金原子於圖案區域之聚二甲基矽氧烷基材上。蝕刻步驟係以清水清洗聚二甲基矽氧烷基材，令金原子選擇性地留存在圖案區域上。藉此，透過金原子沉積條件之控制，可以精確控制所定義金圖案之厚度及薄膜品質，而且此方法所製造的聚二甲基矽氧烷複合結構具有高附著力與良好的穩定度。 A method of manufacturing composite PDMS microstructures is disclosed. The method includes steps as follow. A defining step is provided, which is for defining a MPTMS patterned area with liquid phase on the PDMS surface. A depositing step is provided, which is for depositing a plurality of gold atoms on the MPTMS patterned area by a vacuum coating process. An etching step is provided, which is for washing the composite PDMS microstructures by water, and the Au atoms selectively attach and grow following the MPTMS patterned area. By controlling the depositing condition of Au, the thickness and quality of Au film could be precisely controlled. The patterned Au structure on PDMS has extraordinary strong adhesion and stability. The method provides an extra-facile method for patterning the PDMS structure and has huge potential in the mass production of biomedical and flexible consuming electronic devices.

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