鍍膜裝置

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

103100768

專利證號

I 576450

專利獲證名稱

鍍膜裝置

專利所屬機關 (申請機關)

明新學校財團法人明新科技大學

獲證日期

2017/04/01

技術說明

本技術揭露一種鍍膜裝置，其包含真空鍍膜室、基板承載機構、複數組鍍膜源系統及複數組鍍膜修正板系統，鍍膜修正板系統之數目與鍍膜源系統相同。真空鍍膜室包含底部、頂部及環繞底部及頂部之周圍面。基板承載機構係設置於頂部，複數組鍍膜源系統係設置於底部，鍍膜修正板系統係設置於周圍面。任一鍍膜源系統係與單一且唯一之鍍膜修正板系統配合以進行鍍膜。每一鍍膜修正板系統設置之最佳位置為正對於對應鍍膜源系統之周圍面之左右兩側10度之內的區域。 Disclosed in the present technique a coating apparatus, including a vacuum coating room, a substrate support mechanism, a plurality of coating source systems, and a plurality of coating mask systems. The number of the coating mask systems is equal to that of the coating source systems. The vacuum coating room includes a bottom, a top, and a surrounding surface. The substrate support mechanism is installed on the top, the plurality of coating source systems are installed on the bottom, and the plurality of coating mask systems are installed on the surrounding surface. Any one of the coating source systems is accompanied with one and only one coating mask system to perform coating. The best position to install each coating mask system is within the right and left 10 degrees area of the straight opposite of the corresponding coating source system on the surrounding surface.

備註

本會(收文號1120008428)同意該校112年2月9日明新(產)字第1120001130號函申請終止維護專利(明新科大)

連絡單位 (專責單位/部門名稱)

產學及技術移轉中心

連絡電話

03-5593142 轉2617

網址