發明
中華民國
099141705
M 476258
可用於大範圍量測之多光束干涉儀位移量測系統
國立雲林科技大學
2014/04/11
一種可用於大範圍量測之多光束干涉儀位移量測系統,設有一光源組、一共振腔組及一感測組,該光源組設有一發射器及一偏振片,該共振腔組係用以接收該光源組的偏振光束且設有一鍍膜玻璃平板、一角隅稜鏡及一波長延遲片,該感測組係用以接收該共振腔組所產生的干涉光束並設有一偏振分光鏡、兩光強度檢測器及一訊號處理器,而兩光強度檢測器係分別接收由該偏振分光鏡所分離出的兩道光束並進行量測,而該訊號處理器係對於干涉訊號進行檢測,藉以提供一可抗傾角及環境干擾、具高解析度且可大範圍量測之多光束干涉儀位移量測系統。 A multi-beam interferometer displacement measuring system has a light source module, a resonator module and a detecting device. The light source module has an emitter and a polaroid sheet. The emitter emits a non-polarizing beam. The polaroid sheet receives and transforms the non-polarizing beam into a polarizing beam. The resonator module receives the polarizing beam and has a coated glass panel, a corner cube prism and a wave-delay plate. The coated glass panel receives and reflects the polarizing beam. The corner cube prism receives and reflects the polarizing beam to the coated glass panel to form a resonant cavity. The wave-delay plate is mounted between the coated glass panel and the corner cube prism to receive the polarizing beam. The detecting device faces the coated glass panel to receive the interferential stripes formed in the resonator module and has a polarizing beam splitter, two power detectors and a signal processor.
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