利用溶液製程製作多層膜的方法及其溶液製膜設備Apparatus and method for forming multilayer polymer thin film

專利類型

發明

專利國別 (專利申請國家)

日本

專利申請案號

特願 2008-294266

專利證號

特許 5370959

專利獲證名稱

利用溶液製程製作多層膜的方法及其溶液製膜設備Apparatus and method for forming multilayer polymer thin film

專利所屬機關 (申請機關)

國立交通大學

獲證日期

2013/09/27

技術說明

有機元件通常需要多層不同功能的薄膜以達到最佳元件特性。利用溶液製程不易達到製作多層元件，最主要的原因是第二層的溶劑溶掉並破壞第一層膜。本裝置利用狹縫以阻擋後來的大量溶液直接落在原先的有機分子薄膜上，並以類似刮刀技術決定濕膜厚度，並隨之以加熱裝置將濕膜烤乾而成乾膜。利用此法後續的有機分子濕膜對原先已沉積的有機分子薄膜破壞性為可忽略，且此裝置可調整後續溶液落下成濕膜的速度，故可有效的製作多層膜光電元件。此裝置若調整狹縫長度亦可有效製作大面積，不像傳統的旋轉塗布法，此法對材料的利用率可高達90%以上。 Multilayer device structure is needed in organic devices to get the best performance. However it is difficult to form multilayer in solution process due to the dissolution problem between two layers. The first layer will be dissolved by the solvent of the coming layer. This invention uses a solution container with a gap to prevent the huge amount of solution from directly falling on the first layer. Then the wet film is formed by moving the container with the film thickness is decided by the distance between the gap and the substrate. The wet film is dried in a very short time by the heater therefore there is no time for the second solvent to dissolve the first layer. This way can effectively achieve the large-area and multilayer structure in organic devices through solution process. Compared to spin-coating this way can save more materials up to 90%.

備註

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