APPARATUS AND METHOD FOR TREATING GRAPHENE USING PLASMA AND APPLICATION THEREOF

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

14/701,471

專利證號

US 9,908,779 B2

專利獲證名稱

APPARATUS AND METHOD FOR TREATING GRAPHENE USING PLASMA AND APPLICATION THEREOF

專利所屬機關 (申請機關)

國立臺灣大學

獲證日期

2018/03/06

技術說明

本發明提供一種利用電漿處理石墨烯之裝置與方法、及其應用。主要是利用非真空電漿處理位於基板上之石墨烯漿料，使處理後之石墨烯具有特殊的結構及特性。首先將含有石墨烯之漿料塗佈於一基板上，利用大氣噴射電漿快速處理該漿料，使其於基板上形成三維泡棉狀石墨烯，而所獲得之石墨烯表面亦有鱗片狀結構產生。當所採用的基板為導電基板時，處理所得之石墨烯電極則可作為催化電極之用。發明中所採用之大氣噴射電漿處理程序不僅快速，且僅需習知之爐管退火處理約三分之一的耗能。 The present disclosure is directed to a method and apparatus for treating graphene paste by plasma, and an application thereof. After treated by the atmospheric pressure plasma jet, cracks and protruding flakes become evident and a graphene foam is formed. When a conductive substrate is used, the graphene electrode can be used as a catalytic electrode in an electrochemical or photoelectrochemical device. In addition, compared to the conventional furnace calcination process, the processing time and energy consumption can be greatly reduced by using the atmospheric pressure plasma jet treatment.

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