三維奈微米結構製作裝置與方法

專利類型

發明

專利國別 (專利申請國家)

中華民國

專利申請案號

094101351

專利證號

I261687

專利獲證名稱

三維奈微米結構製作裝置與方法

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2006/09/11

技術說明

An apparatus for fabricating a three-dimensional nano/micro structure is provided in the present invention. The apparatus includes a laser source for providing a laser beam, a light-splitting system for generating at least a first light beam and a second light beam from the laser beam, a lens for focusing the first light beam and the second light beam on a focus so as to form an interference pattern thereon and a holder for carrying a substrate having plural first and second nano/micro particles therein. Through the present invention, the first and second nano/micro particles are formed as a two-dimensional structure corresponding to the interference pattern to be further deposited on the substrate, so that the three-dimensional nano/micro structure is successively formed thereby with a high efficiency and precision.

備註

本部(收文號1070053905)同意該校107年7月31日清智財字第1079004602號函申請申請終止維護專利

連絡單位 (專責單位/部門名稱)

智財技轉組

連絡電話

03-5715131-62219

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