Method for Manufacturing a Polymer Molecular Film for photo-electronic device

專利類型

發明

專利國別 (專利申請國家)

美國

專利申請案號

12/571,110

專利證號

US 8,790,746

專利獲證名稱

Method for Manufacturing a Polymer Molecular Film for photo-electronic device

專利所屬機關 (申請機關)

國立清華大學

獲證日期

2014/07/29

技術說明

本發明提供一種高分子薄膜、包含該高分子薄膜之光電元件以及製造該高分子薄膜以及該光電元件之方法。根據本發明之高分子薄膜係經由一變形製程形成於ㄧ基材上。特別地，該高分子薄膜包含複數個共軛高分子，其中至少一共軛高分子具有拉伸的分子結構。藉此，本發明之高分子薄膜可使其所製成的光電元件具有良好的發光或發電效率。此高分子薄膜可以利用薄膜除潤的方法,塗佈於大面積的表面,而除潤方法可以採用升溫處理或以合適的有機蒸汽處理. 其它薄膜生成方法能造成其內共軛高分子鏈的拘束以產生光電效率提升也在包含之內. The present invention provides a polymer molecular film, a photo-electric device comprising the same and method for manufacturing the same. The polymer molecular film of the invention is formed via a deformation process on a substrate. Particularly, the polymer molecular film includes a plurality of conjugated polymers, and at least one of the conjugated polymers has a stretched molecular structure. As a result, the photo-electric device having said polymer molecular film performs with good lighting or power generating efficiency. The manufacturing processes of the ultrathin polymer films by thin film dewetting, via thermal treatment or imbibing in vapors of suitable solvents, are suitable for large area coating. Other ultrathin films that contain molecular constrained conjugated polymer molecules to the point to yield considerably enhanced optoelectronic efficiencies are also included.

備註

本部(收文號1110008609)同意該校111年2月15日清智財字第1119000986號函申請終止維護專利(國立清華大學)

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